Daybreak Arts’ Next Horizon Academy is a multi-year, skills-based education and mentorship program designed to support Daybreak Artists as they advance their professional art practice.
Built in response to Daybreak artists’ desire for deeper learning and growth, the Next Horizon Academy offers structured pathways that help artists hone their craft, strengthen their creative voice, navigate the professional art world, and reach what’s next in their artistic careers. Like a horizon, the Next Horizon Academy represents both what we see and the promise ahead—supporting artists to create, exhibit, and step confidently into the broader art world.
Through individualized mentorship, peer support, and hands-on learning, artists develop cohesive bodies of work, build professional portfolios, and gain real-world experience preparing and presenting their own solo exhibitions. The Next Horizon Academy expands possibilities and prepares artists to reach the next horizon in their artistic practice.
Become a Daybreak Artist Mentor
A key component of the Next Horizon Academy is the Artist Mentor Program, which provides individualized guidance as Daybreak Artists strengthen their creative skills, develop cohesive bodies of work, build professional portfolios, and prepare to present solo exhibitions through real-world experience.
Why Become a Daybreak Mentor
Mentoring a Daybreak Artist is more than sharing skills—it’s helping someone thrive, grow, and rebuild their life through art—despite the systemic barriers and limited access they often face. Daybreak Artists experience challenges that often exclude them from traditional art world opportunities. By offering guidance, encouragement, and professional insight, Daybreak Mentors play a vital role in supporting artists as they develop their creative voice, build confidence, and take meaningful steps toward their goals. Your time and expertise can help artists produce cohesive bodies of work, present solo exhibitions, and navigate the professional art world with independence and pride.

